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Studies on the Effect of Laser Cooling in Atom Lithography for Nanometrology

Gong Wei-Gang, Ma YanZhang Ping-ping, Zhang Wan-jingLi Tong-Bao

 

ABSTRACT

To meet the requirement of nanoscale dimensional metrology, lengthy standards with features below 100 nanometers are indispensable instruments. Our group has successfully fabricated length standards through atom lithography. For further improvement of the quality of these standards, laser cooling of Chromium atom beam was studied through a transverse Doppler cooling scheme. Moreover, utilizing the SDK of CCD camera, we developed an image collecting software, which had functions of real-time display for gray-scale image and image measure. In our experimental setup, with the software, we could detect LIF spots from marginal beams to monitor and analyze the effect of laser cooling.

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